ASM A400
Introduction to the ASM A400
The ASM A400 is a batch vertical furnace designed for 200mm and smaller wafers, targeting applications in power, analog, RF, and MEMS devices. The A400's vertical batch processing increases productivity by allowing a large stack of wafers to be loaded into the furnace chamber for simultaneous thermal processing. This architecture enables the A400 to achieve high-throughput and efficient thermal processing, making it an ideal solution for semiconductor manufacturing.Technical Specifications
The ASM A400's technical specifications are summarized in the following table:Performance and Architecture
The ASM A400's performance is characterized by its high-throughput and efficient thermal processing capabilities. The A400's dual reactor chambers enable simultaneous thermal processing of multiple wafers, increasing productivity and reducing processing time. The A400's thermal processing capability reaches up to 1200°C, making it suitable for a wide range of applications in power, analog, RF, and MEMS devices. The A400's architecture is designed to accommodate advanced wafer transfer systems, such as Fortrend's 200mm SMIF system. This system offers precision wafer transfer and seamless wafer handling solutions, designed for optimal performance and efficiency in 200mm wafer processing. The A400's compatibility with such systems enables it to achieve high-throughput and efficient thermal processing, making it an ideal solution for semiconductor manufacturing.
What is the ASM A400's wafer size capability?
The ASM A400 is designed for 200mm and smaller wafers.
What is the A400's thermal processing capability?The A400's thermal processing capability reaches up to 1200°C.
What is the A400's wafer handling solution?The A400 is compatible with Fortrend's 200mm SMIF system, offering precision wafer transfer and seamless wafer handling solutions.
What are the A400's applications?The A400 is designed for applications in power, analog, RF, and MEMS devices.
What is the A400's performance level compared to similar furnaces?The A400 has a 30-40% higher performance level compared to similar furnaces.
Specifications
| Parameter | Specification |
|---|---|
| Wafer Size | 200mm and smaller |
| Reactor Chambers | Dual reactor chambers |
| Thermal Processing Capability | Up to 1200°C |
| Wafer Handling Solution | Compatible with Fortrend's 200mm SMIF system |
| Productivity | High-throughput and efficient thermal processing |
| Applications | Power, analog, RF, and MEMS devices |
| Performance | 30-40% higher performance level compared to similar furnaces |
| Maturity | Over 25 years of maturity in semiconductor manufacturing |