Canon FPA-5510iZ.
Introduction to Canon FPA-5510iZ
The Canon FPA-5510iZ is a stepper lithography system developed by Canon, designed for use in semiconductor front-end processes and advanced packaging. The system utilizes a 365nm i-line light source, which is a Mercury lamp-based technology, to achieve high-resolution patterning on 300mm wafers. The FPA-5510iZ is designed to meet the stringent requirements of the semiconductor industry, with a focus on delivering high-quality and reliable performance.Technical Specifications
The Canon FPA-5510iZ has a range of technical specifications that make it an ideal solution for advanced semiconductor manufacturing. Some of the key specifications include:Performance and Applications
The Canon FPA-5510iZ is designed to deliver high-performance and reliable results in a range of semiconductor manufacturing applications. The system's advanced technology and precise engineering make it an ideal solution for 55nm logic chip and 3D packaging TSV processes. The FPA-5510iZ is also suitable for use in a range of other applications, including advanced packaging, MEMS, and nanotechnology.
What is the wavelength of the light source used in the Canon FPA-5510iZ?
The Canon FPA-5510iZ uses a 365nm i-line light source, which is a Mercury lamp-based technology.
What is the maximum wafer size that can be handled by the Canon FPA-5510iZ?The Canon FPA-5510iZ can handle wafers up to 300mm (12 inches) in size.
What is the resolution of the Canon FPA-5510iZ?The Canon FPA-5510iZ has a resolution of 0.35μm.
What is the overlay accuracy of the Canon FPA-5510iZ?The Canon FPA-5510iZ has an overlay accuracy of 30nm.
Specifications
| Specification | Value |
|---|---|
| Light Source | 365nm i-line (Mercury lamp) |
| Wafer Size | 300mm (12 inches) |
| Resolution | 0.35μm |
| Overlay Accuracy | 30nm |
| Throughput | Up to 100 wafers per hour |
| Stage Accuracy | ±0.5μm |
| Alignment Accuracy | ±0.1μm |
| Power Consumption | Up to 50kW |