KLA-Tencor Inspira 420
Introduction to the KLA-Tencor Inspira 420
The KLA-Tencor Inspira 420 is a high-end metrology tool designed for advanced semiconductor manufacturing. It offers a range of innovative features, including advanced optical and electrical capabilities, and is capable of delivering high-accuracy measurements and improved process control. The Inspira 420 is designed to meet the demanding requirements of modern semiconductor manufacturing, where precision and accuracy are critical.Technical Specifications
The following table outlines the key technical specifications of the KLA-Tencor Inspira 420:Performance Nodes and Benchmarks
The KLA-Tencor Inspira 420 has been designed to deliver high-performance and accuracy in a range of applications. The following performance nodes and benchmarks demonstrate its capabilities: The Inspira 420 has been shown to deliver high-accuracy measurements in a range of applications, including: - Critical dimension (CD) measurements: ±0.5nm - Overlay measurements: ±0.5nm - Thickness measurements: ±0.1% The Inspira 420 has also been shown to deliver high-throughput and productivity, with a maximum throughput of up to 200 wafers per hour.
What is the Inspira 420's measurement range?
The Inspira 420's measurement range is 10nm - 100μm.
What is the Inspira 420's resolution?The Inspira 420's resolution is 0.1nm.
What is the Inspira 420's throughput?The Inspira 420's throughput is up to 200 wafers per hour.
What type of optical system does the Inspira 420 use?The Inspira 420 uses an advanced broadband plasma illumination optical system.
Specifications
| Parameter | Value |
|---|---|
| Measurement Range | 10nm - 100μm |
| Resolution | 0.1nm |
| Accuracy | ±0.5% |
| Throughput | Up to 200 wafers per hour |
| Optical System | Advanced broadband plasma illumination |
| Electrical System | High-speed, low-noise data acquisition |
| Stage System | Precision air-bearing stage with <0.1μm accuracy |
| Software | Advanced data analysis and reporting capabilities |