Executive Summary

Nova Measuring Instruments has been a pioneer in the field of integrated metrology, revolutionizing the semiconductor industry by embedding measurement capabilities directly within process tools to enable real-time, wafer-to-wafer control. The Nova ME7 Metrology System is a comprehensive suite of materials and dimensional metrology combined with advanced modeling for semiconductor manufacturers. This system is designed to provide critical metrology solutions that are closer to a semiconductor fab’s process and integration needs.

The Nova ME7 Metrology System is built on the concept of virtual metrology, which involves developing machine learning-based models to predict meaningful quality targets of one or more fabrication processes. This is achieved by using tool status variables, process recipe variables, and physical metrology variables of sampled wafers as preprocessed inputs. The system’s advanced modeling capabilities include model-based, machine learning, advanced hybrid metrology, and big data analysis algorithms that enable high-performance metrology and deliver breakthrough performance in time to solution and accuracy for the most complex 3D structures.

Architecture & Design

The Nova ME7 Metrology System is designed to provide highly sensitive in-line materials metrology solutions on high productivity platforms. The system’s architecture is based on a comprehensive suite of materials and dimensional metrology combined with advanced modeling for semiconductor manufacturers. This includes integrated and standalone optical metrology platforms for optical critical dimensions (CD) and thin film measurements, which increase productivity, reliability, and accuracy for the manufacturing of the most advanced semiconductor technology nodes.

The system’s design is focused on providing unique, scalable solutions to address the semiconductor industry’s materials metrology challenges. The Nova ME7 Metrology System is built on a modular architecture, allowing for easy integration with existing process tools and fabrication lines. The system’s advanced modeling capabilities are based on machine learning algorithms that enable high-performance metrology and deliver breakthrough performance in time to solution and accuracy for the most complex 3D structures.

The Nova ME7 Metrology System supports a wide range of process nodes, including the most advanced technology nodes. The system’s data bus is designed to provide high-speed data transfer and processing, enabling real-time, wafer-to-wafer control. The system’s key ICs are designed to provide high-performance processing and advanced modeling capabilities, enabling the system to deliver accurate and reliable metrology results.

Performance & Thermal

The Nova ME7 Metrology System is designed to provide high-performance metrology and deliver breakthrough performance in time to solution and accuracy for the most complex 3D structures. The system’s advanced modeling capabilities are based on machine learning algorithms that enable high-performance metrology and deliver accurate and reliable results.

The system’s thermal solution is designed to provide efficient cooling and heat dissipation, enabling the system to operate at optimal temperatures and maintain high performance. The system’s TDP (Thermal Design Power) is not publicly disclosed, but it is designed to provide efficient power consumption and minimize heat generation.

The Nova ME7 Metrology System has been benchmarked against other metrology systems, and it has demonstrated superior performance and accuracy. The system’s performance is measured by its ability to provide accurate and reliable metrology results, and its thermal solution is designed to maintain optimal temperatures and minimize heat generation.

• High-performance metrology and breakthrough performance in time to solution and accuracy
• Advanced modeling capabilities based on machine learning algorithms
• Efficient cooling and heat dissipation
• Optimal temperatures and minimal heat generation

Market Positioning

The Nova ME7 Metrology System is positioned as a leading solution for semiconductor manufacturers, providing critical metrology solutions that are closer to a semiconductor fab’s process and integration needs. The system is designed to provide unique, scalable solutions to address the semiconductor industry’s materials metrology challenges.

The Nova ME7 Metrology System competes with other metrology systems in the market, but it has demonstrated superior performance and accuracy. The system’s target buyer is semiconductor manufacturers, and it is designed to provide accurate and reliable metrology results for the most complex 3D structures.

The Nova ME7 Metrology System is part of Nova’s comprehensive suite of materials and dimensional metrology combined with advanced modeling for semiconductor manufacturers. The system is designed to provide critical metrology solutions that are closer to a semiconductor fab’s process and integration needs, and it is positioned as a leading solution for semiconductor manufacturers.