SCREEN Wafer Cleaning System SU-3200

Review Cycle

February 2026

SCREEN Wafer Cleaning System SU-3200 — Source: images-spe.screen.co.jp

The Verdict

Executive Summary

The SCREEN Wafer Cleaning System SU-3200 is a high-performance, hybrid-type cleaning system designed for advanced semiconductor manufacturing. It combines chemical etching/cleaning functions with a brush cleaning function, supporting wafer backside cleaning and wet etch processes. With an impressively high throughput of up to 800 wafers per hour, the SU-3200 is an ideal solution for demanding semiconductor fabrication environments. The system's expandability up to 12 chambers and availability with either dynamic direct injection (DDI) or cabinet-type chemical supply system make it a versatile and scalable solution. The SU-3200 is part of a growing market, with the semiconductor single wafer cleaner market projected to grow at a CAGR of 6% from 2026 to 2033. With its advanced features and high-performance capabilities, the SCREEN Wafer Cleaning System SU-3200 is poised to play a significant role in the production of next-generation memory, logic, and power devices. Its ability to ensure defect-free surfaces after thin-film or dielectric layers are applied makes it an essential tool in the fabrication of advanced semiconductor devices.

Introduction to the SCREEN Wafer Cleaning System SU-3200

The SCREEN Wafer Cleaning System SU-3200 is a cutting-edge, hybrid-type cleaning system designed to meet the demanding requirements of advanced semiconductor manufacturing. The system combines chemical etching/cleaning functions with a brush cleaning function, providing a comprehensive cleaning solution for wafer backside cleaning and wet etch processes.

Key Features and Specifications

The SCREEN Wafer Cleaning System SU-3200 boasts an impressive array of features and specifications, including:

Performance and Benefits

The SCREEN Wafer Cleaning System SU-3200 offers a range of benefits, including high throughput, flexibility, and scalability. Its ability to support wafer backside cleaning and wet etch processes makes it an essential tool in the fabrication of advanced semiconductor devices. The system's high-performance capabilities and advanced features ensure defect-free surfaces after thin-film or dielectric layers are applied, supporting the production of next-generation memory, logic, and power devices.

What is the throughput of the SCREEN Wafer Cleaning System SU-3200?

The SCREEN Wafer Cleaning System SU-3200 has a throughput of up to 800 wafers per hour.

What types of cleaning functions does the SU-3200 support?

The SU-3200 supports chemical etching/cleaning functions and brush cleaning functions.

What is the market projection for the semiconductor single wafer cleaner market?

The semiconductor single wafer cleaner market is projected to grow at a CAGR of 6% from 2026 to 2033.

What is the application of the SCREEN Wafer Cleaning System SU-3200?

The SCREEN Wafer Cleaning System SU-3200 is designed for advanced semiconductor manufacturing.

Specifications

Feature	Specification
Throughput	Up to 800 wafers per hour
Expandability	Up to 12 chambers
Chemical Supply System	Dynamic direct injection (DDI) or cabinet-type
Wafer Size	300mm
Cleaning Functions	Chemical etching/cleaning and brush cleaning
Processes Supported	Wafer backside cleaning and wet etch processes
Application	Advanced semiconductor manufacturing
Market Projection	Projected to grow at a CAGR of 6% from 2026 to 2033