Tokyo Electron Limited TEL ACT8
Introduction to the TEL ACT8
The Tokyo Electron Limited TEL ACT8 is a state-of-the-art coater/developer designed to meet the evolving needs of the semiconductor industry. As part of the CLEAN TRACK series, the ACT8 builds upon the success of its predecessors, incorporating advanced technology and innovative design principles to deliver unparalleled performance and productivity.Technical Specifications
The TEL ACT8 boasts an impressive array of technical specifications, including:Performance Nodes and Benchmarks
The TEL ACT8 is designed to deliver exceptional performance and productivity, with a range of technical features and capabilities that enable it to meet the demanding requirements of modern semiconductor production. Its performance nodes are tailored to support high-yield and high-reliability manufacturing, with benchmarks demonstrating its capacity to enhance litho-cluster productivity and process performance.
What is the wafer size supported by the TEL ACT8?
The TEL ACT8 supports 300/200mm wafer sizes.
What is the coating capability of the TEL ACT8?The TEL ACT8 features advanced coating technology for high-precision applications.
What is the developing capability of the TEL ACT8?The TEL ACT8 features high-performance developing technology for enhanced process control.
What is the temperature control precision of the TEL ACT8?The TEL ACT8 features high-precision temperature control for optimal process conditions.
What is the process chamber design of the TEL ACT8?The TEL ACT8 features an enhanced process chamber design for improved yield and reliability.
Specifications
| Specification | Description |
|---|---|
| Wafer Size | 300/200mm |
| Coating Capability | Advanced coating technology for high-precision applications |
| Developing Capability | High-performance developing technology for enhanced process control |
| Temperature Control | High-precision temperature control for optimal process conditions |
| Process Chamber Design | Enhanced process chamber design for improved yield and reliability |
| Productivity | High-capacity design for enhanced litho-cluster productivity |
| Process Performance | Advanced process control for superior process performance |
| Benchmarks | Exceptional benchmarks demonstrating enhanced litho-cluster productivity and process performance |